Olympus Microscope DIC*1 POL, UIS2 Mplfln, Lmplfln, Mpln, Lcplfln-Lcd, Uis, Mplfln-Bdp

UIS2/UIS OBJECTIVE LENSES

■Meaning of abbreviations shown on objective lens

M P L (Plan) F L N - 1 0 0 B D

M:	Metallurgical (no cover)	PL: Plan/
LM:	Long working distance	Corrects field
	metallurgical use	curvature of
SLM: Super long working		the periphery of
		the image plane
	distance metallurgical use
LC:	Observation through
	substrate

None: Achromat/

Corrects aberration at 2 wavelengths of blue and red

FL: SemiApochromat/

Corrects chromatic aberration in the visible range (violet~red)

APO: Apochromat/

Optimally corrects chromatic aberration in the entire visible band (violet~red)

None: UIS		Number:	None: Brightfield
N:	UIS2	Objective lens	BD:	Brightfield/darkfield
		magnification	BDP: Brightfield/darkfield/
				polarizing
			IR:	IR
			LCD:	LCD

■Objective lens notation

Magnification

Objective lenses series abbreviation (PL: Plan)

N.A. (Numerical Aperture)

Infinity-corrected optical system

For brightfield observation

Cover glass thickness (no cover) Field Number

■Objective lens series list

	Series	Magnification	BF	DF	DIC*1	POL	FL	F.N. (Field Number)	Remarks
UIS2	MPLFLN	1.25/2.5	\					1.25x: 22 / 2.5x: 26.5	Use together with polarizer and analyzer
									recommended
		5/10/20/50/100	\		\U	\	\*2	26.5
	LMPLFLN	5/10/20/50/100	\		\L	\	\	26.5
	MPLN	5/10/20/50/100	\					22
	LCPLFLN-LCD	20/50/100	\		\L			26.5	For LCD
UIS	MPlanApo	20/50/100	\		\*3 U	\		26.5
	SLMPlan	20/50	\					26.5
	LMPlanIR/MPlanIR	5/10/20/50/100 *4	\					22	For near-IR observation
UIS2	MPLFLN-BD	5/10/20/50/100/150	\	\	\U	\	\*2	26.5
	MPLFLN-BDP	5/10/20/50/100	\	\	aU	a	\*2	26.5
	LMPLFLN-BD	5/10/20/50/100	\	\	\L	\	\	26.5
	MPLN-BD	5/10/20/50/100	\	\				22
UIS	MPlanApo-BD	100	\	\	\U	\		26.5

*1	DIC prism U-DICR: UM/LM position, U-DICRHC: LM position fixed, U-DICRH: UM position fixed. *2 5~20x: U excitation also possible
*3	50x: DIC observation not applicable	*4 MPlanIR: available 100x only \: Responds a: Optimally responds BF: Brightfield DF: Darkfield
DIC: Differential Interference Contrast		POL: Polarized light FL: Fluorescence

■Features of objective lens series

a MPLFLN series: M Plan SemiApochromat — P 8

Plan SemiApochromat objective lenses, giving high-level correction for chromatic aberration. The lineup consists of 7 objective lenses ranging from 1.25x to 100x, and secures a W.D. of 1mm or longer. Since the exit pupil position of the 5x-100x objective lenses is standardized, the position of the DIC prism does not have to be switched when changing the magnification. For ultra low magnifications (1.25x, 2.5x), use together with analyzer and polarizer of the reflected light illuminator.

a LMPLFLN series: Long WD M Plan SemiApochromat — P 9

Long working distance Plan SemiApochromat objective lenses, giving high-level correction for chromatic aberration. Suitable with samples having a height difference and in preventing collision, as the working distance is long. Also, since the exit pupil position of the 5x-100x objective lenses is standardized, the position of the DIC prism does not have to be switched when changing the magnification.

a MPLN series: M Plan Achromat — P 10

Plan Achromat objective lenses providing excellent image flatness up to F.N. 22.

a LCPLFLN-LCD series: LCD Long WD M Plan SemiApochromat — P 11

Perfect objective lens series for observation of LCD panels and other samples through a glass substrate. Aberration correction matched to the glass thickness is accomplished using a correction ring.

a MPlanApo series: M Plan Apochromat — P 12

Highest class Plan Apochromat objective lenses that maximize performance in brightfield observation. All aberrations are corrected at the highest level, while providing high N.A.

a SLMPlan series: Super Long WD M Plan Achromat — P 12

Plan Achromat objective lenses with high magnification and super long working distance. Two magnifications, 20x and 50x are available. For 5x or 10x objective lenses, select from the LMPLFLN Series.

a LMPlan-IR series: IR Long WD M Plan SemiApochromat — P 13

MPlan-IR: IR M Plan SemiApochromat — P 13

IR objective lenses which compensate for aberrations from visible to near infrared light. Ideal for the observations of semiconductor interiors and the back surface of a chip package as well as CSP bump inspection.

a MPLFLN-BD series: M Plan SemiApochromat BD — P 14

Plan SemiApochromat objective lenses, giving high-level correction for chromatic aberration. The series secures a W.D. of 1mm or longer. Since the exit pupil position of the 5x-150x objective lenses is standardized, the position of the DIC prism does not have to be switched when changing the magnification.

a MPLFLN-BDP series: M Plan SemiApochromat BDP — P 15

Plan SemiApochromat objective lenses, giving high-level correction for chromatic aberration. The series secures a W.D. of 1mm or longer. Since the exit pupil position of the 5x-100x objective lenses is standardized, the position of the DIC prism does not have to be switched when changing the magnification. The BDP series optimizing brightfield/darkfield and polarized light characteristics is perfect for Nomarski DIC and polarized light observations.

a LMPLFLN-BD series: Long WD M Plan SemiApochromat BD — P 16

Long working distance Plan SemiApochromat objective lenses, giving high-level correction for chromatic aberration. Suitable with samples having a height difference and in preventing collision, as the working distance is long. Also, since the exit pupil position of the 5x-100x objective lenses is standardized, the position of the DIC prism does not have to be switched when changing the magnification.

a MPLN-BD series: M Plan Achromat BD — P 17

Plan Achromat objective lenses providing excellent image flatness up to F.N. 22.

a MPlanApo BD: Plan Apochromat BD — P 18

Highest class Plan Apochromat objective lens that maximize performance in brightfield and darkfield observations. All aberrations are corrected at the highest level, while providing high N.A.

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