Kodak P-255 manual min =0.70

	4.0	Exposure: Daylight, 1/25 second
		Process: Small tank, KODAK TECHNIDOL Liquid
		Developer	5, 7, 9, and 11 minutes at
		68 F (20 C), agitation at 30-second intervals
	3.0				Developing		Exposure		Contrast
					Time (min)		Index			Index
		CONTRAST			5		16			0.48
					7		20			0.58
		INDEX
DENSITY					9		25			0.64
		0.70			11		25			0.70
	2.0	0.60
		0.50			11 min		=0.70
		0.40			9 min	=0.65
	1.0	5	7	9	11
		DEVELOPMENT TIME
		(minutes)						7 min		=0.60
							5 min	=0.50

0.0

3.02.01.00.01.0

LOG EXPOSURE (lux-seconds) F002_0193AC

4.0

Exposure: Tungsten, 1/25 second

Process: Small tank, KODAK Developer D-76; 6, 8, 10, and 12 minutes at 68 F (20 C), agitation at 30-second intervals

	3.0
			CONTRAST			EXPOSURE
DENSITY		GAMMA	INDEX			INDEX
			2.00
	2.0		1.75			125
			1.50			100
			1.25			75
			1.00			50	12 min	=2.50
				8	10	12
			6
	1.0		DEVELOPMENT TIME				10 min	=2.00
				(minutes)

8 min =1.50

6 min =1.20

0.0
3.0	2.0	1.0	0.0	1.0

F002_0186AC LOG EXPOSURE (lux-seconds)

4.0Exposure: Daylight, 1/25 second

Process: KODAK VERSAMAT 641 Chemicals at 5, 10, 15, 20, and 25 ft/min at 85 F (29.4 C); KODAK VERSAMAT Film Processor,

Model 11; 1 developer rack

5 fpm =2.90

3.0

CONTRAST EXPOSURE

INDEXINDEX

DENSITY		2.20	200	DENSITY
		1.00	50
		1.80	150
	2.0	1.40	100
		0.60

510 15 20 25 MACHINE SPEED

(fpm)

1.0			10 fpm =1.55
			15 fpm	=1.30
			20 fpm	=1.05
			25 fpm =0.85
0.0
3.0	2.0	1.0	0.0	1.0

LOG EXPOSURE (lux-seconds) F002_0191AC

DENSITY

DENSITY

4.0Exposure: Daylight, 1/25 second

Process: KODAK VERSAMAT 885 Chemicals at 85 F (29.4 C); KODAK VERSAMAT Film Processor, Model 11; 1 developer rack

3.0

CONTRAST EXPOSURE

INDEXINDEX

2.60250

2.20	200
2.0

1.80150

1.40100

1.00			5 fpm		=3.60
5	10 15 20 25		10 fpm		=2.80
MACHINE SPEED			15 fpm		=2.20
1.0	(fpm)
			20 fpm	=1.60
			25 fpm	=1.35
0.0
3.0	2.0	1.0	0.0		1.0

LOG EXPOSURE (lux-seconds) F002_0190AC

4.0Exposure: Daylight, 1/25 second

Process: KODAK DURAFLO RT Developer at

5, 10, 15, and 20 ft/min at 85 F (29.4 C); KODAK VERSAMAT Film Processor,

Model 11; 2 developer racks

5 fpm =2.40

3.0
CONTRAST	EXPOSURE
INDEX	INDEX
2.20	200
1.80	150
2.0	100
1.40
1.00	50
0.60

510 15 20 MACHINE SPEED

1.0	(fpm)		10 fpm =1.60
			15 fpm	=1.00
			20 fpm	=0.80
0.0
3.0	2.0	1.0	0.0	1.0

LOG EXPOSURE (lux-seconds) F002_0192AC

KODAK PROFESSIONAL Technical Pan Film • P-255 11