Fujitsu Transistor, Interconnect, 130nm node CMOS Process CS90A, Cell Size = 1.98µm2, Sram

Models: CS90A

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130nm node CMOS Process (CS90A)

130nm node CMOS Process (CS90A)

Transistor

SRAM
1.65µm

Cell Size = 1.98µm2

(1.2µm x 1.65µm)

(2nd Generation SRAM)

Interconnect

Al

Al

7-Cu

6-Cu

SiLK5-Cu

4-Cu

TransistorSRAM1.65µm3-Cu

2-Cu

1-Cu

SiO2 Cell Size = 1.98µm2(1.2µm x 1.65µm)(2nd Generation SRAM)Interconnect7-CuSiLK5-CuSiO2 Global Metal:Thick Cu + SiO2Intermediate Metal:FUJITSU MICROELECTRONICS AMERICA, INC.Corporate Headquarters
Global Metal:

AL (Fuse & Pad)

Pitch: 1.8m

Semi Global Metal:

Thick Cu + SiO2

Pitch: 0.6m

Intermediate Metal:

Thin Cu + SiLK

Pitch: 0.4m

FUJITSU MICROELECTRONICS AMERICA, INC.

Corporate Headquarters1250 E. Arques Ave. Sunnyvale, CA 94088-3470 Tel: (800) 866-8608 Fax: (408) 737-5999

E-mail: inquiry@fma.fujitsu.com Web Site: http://www.fma.fujitsu.com

©2003 Fujitsu Microelectronics America, Inc.

All company and product names are trademarks or registered trademarks of their respective owners. Printed in the U.S.A. WFS-FS-20983-7/2003

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Fujitsu Transistor, Interconnect, 130nm node CMOS Process CS90A, Fujitsu Microelectronics America, Inc, 1.2µm x 1.65µm