| 4.0 | Exposure: Daylight, 1/25 second |
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| Process: Small tank, KODAK TECHNIDOL Liquid |
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| Developer | 5, 7, 9, and 11 minutes at |
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| 68 F (20 C), agitation at |
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| 3.0 |
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| Developing | Exposure | Contrast | |||
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| Time (min) | Index |
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| CONTRAST |
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| 5 |
| 16 |
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| 0.48 |
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| 7 |
| 20 |
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| 0.58 | |
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DENSITY |
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| 9 |
| 25 |
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| 0.64 | |
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| 0.70 |
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| 11 |
| 25 |
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| 0.70 | |
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| 2.0 | 0.60 |
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| 0.50 |
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| 11 min | =0.70 |
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| 0.40 |
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| 9 min | =0.65 |
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| 1.0 | 5 | 7 | 9 | 11 |
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| DEVELOPMENT TIME |
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| (minutes) |
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| 7 min | =0.60 | |||
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| 5 min | =0.50 | ||
0.0
3.02.01.00.01.0
LOG EXPOSURE | F002_0193AC |
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4.0
Exposure: Tungsten, 1/25 second
Process: Small tank, KODAK Developer
| 3.0 |
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| CONTRAST |
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| EXPOSURE |
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DENSITY |
| GAMMA | INDEX |
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| INDEX |
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| 2.00 |
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| 2.0 |
| 1.75 |
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| 125 |
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| 1.50 |
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| 100 |
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| 1.25 |
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| 75 |
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| 1.00 |
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| 50 | 12 min | =2.50 |
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| 8 | 10 | 12 | |||
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| 6 |
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| 1.0 |
| DEVELOPMENT TIME | 10 min | =2.00 | |||
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8 min =1.50
6 min =1.20
0.0 |
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3.0 | 2.0 | 1.0 | 0.0 | 1.0 |
F002_0186AC | LOG EXPOSURE |
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4.0Exposure: Daylight, 1/25 second
Process: KODAK VERSAMAT 641 Chemicals at 5, 10, 15, 20, and 25 ft/min at 85 F (29.4 C); KODAK VERSAMAT Film Processor,
Model 11; 1 developer rack
5 fpm =2.90
3.0
CONTRAST EXPOSURE
INDEXINDEX
DENSITY |
| 2.20 | 200 | DENSITY |
| 1.00 | 50 | ||
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| 1.80 | 150 |
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| 2.0 | 1.40 | 100 |
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| 0.60 |
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510 15 20 25 MACHINE SPEED
(fpm)
1.0 |
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| 10 fpm =1.55 | |
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| 15 fpm | =1.30 |
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| 20 fpm | =1.05 |
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| 25 fpm =0.85 | |
0.0 |
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3.0 | 2.0 | 1.0 | 0.0 | 1.0 |
LOG EXPOSURE | F002_0191AC |
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DENSITY
DENSITY
4.0Exposure: Daylight, 1/25 second
Process: KODAK VERSAMAT 885 Chemicals at 85 F (29.4 C); KODAK VERSAMAT Film Processor, Model 11; 1 developer rack
3.0
CONTRAST EXPOSURE
INDEXINDEX
2.60250
2.20 | 200 |
2.0 |
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1.80150
1.40100
1.00 |
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| 5 fpm | =3.60 | |
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5 | 10 15 20 25 |
| 10 fpm | =2.80 | |
MACHINE SPEED |
| 15 fpm | =2.20 | ||
1.0 | (fpm) |
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| 20 fpm | =1.60 | |
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| 25 fpm | =1.35 | |
0.0 |
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3.0 | 2.0 | 1.0 | 0.0 |
| 1.0 |
LOG EXPOSURE | F002_0190AC |
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4.0Exposure: Daylight, 1/25 second
Process: KODAK DURAFLO RT Developer at
5, 10, 15, and 20 ft/min at 85 F (29.4 C); KODAK VERSAMAT Film Processor,
Model 11; 2 developer racks
5 fpm =2.40
3.0 |
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CONTRAST | EXPOSURE |
INDEX | INDEX |
2.20 | 200 |
1.80 | 150 |
2.0 | 100 |
1.40 | |
1.00 | 50 |
0.60 |
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510 15 20 MACHINE SPEED
1.0 | (fpm) |
| 10 fpm =1.60 | |
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| 15 fpm | =1.00 |
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| 20 fpm | =0.80 |
0.0 |
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3.0 | 2.0 | 1.0 | 0.0 | 1.0 |
LOG EXPOSURE | F002_0192AC |
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KODAK PROFESSIONAL Technical Pan Film • | 11 |
