A thin layer of silicon dioxide is grown on a section of silicon and a conductive gate structure is applied over the oxide. Applying a positive electrical potential to the gate creates a depletion region where the free electrons generated by incoming photons can be stored. A potential well collects electronic charge from any source until the well is filled. Practical potential well capacities range up to a million electrons. Depletion depths range from a few micrometers up to tens of micrometers in specially prepared silicon.
Electrons freed by thermal agitation and by
Charge Transfer The charge collected in a potential well must be brought to an output amplifier. When a series of oxide and conductive gate structures is fabricated with multiple phases, potential wells can be propagated through a silicon sheet.
This charge transfer concept is essential to understanding
Charge Transfer
Direction of Charge Transfer
Phase 1
Phase 2
Phase 3
Gate
SiO2layer |
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t0 | Q 2 | ||
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t1 |
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t2 | Q 2 | ||
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t3 |
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| Q 1 | Q 2 | |
t4 |
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The illustration is simplified to emphasize the concept. To ensure effective charge transfer, charge propagation actually occurs in a channel buried just below the surface, where there is no interference from interface states. The gates actually overlap, to create the drift field required for efficient charge transfer.
30Advanced Camera Operation Manual