DCP200 Profile Controller & Recorder - Product Manual

PD Control

Proportional and Derivative (PD) control combines proportional control with derivative action. It is similar to PID control, but without Integral action.

Also refer to: Derivative, Integral, PID Control, Proportional Control and Tuning.

PI Control

Proportional and Integral Control (PI) is most often used for modulating valve or motor control. It combines proportional control with integral action. It is similar to PID Control, but without derivative action that can cause excessive valve movement.

Also refer to: Derivative, Integral, Modulating Valve, PID Control, Proportional Control and Tuning.

PID Control

Proportional Integral and Derivative control maintains accurate and stable levels in a process (e.g. when controlling a temperature). Proportional Control avoids the oscillation characteristic of On-Off control by continuously adjusting the correcting variable output(s) to keep the process variable stable. Integral action eliminates control deviation errors, and Derivative action counters rapid process movements.

Also refer to: Control Action, Control Deviation, Control Enable, Control Type, Controller, Correcting Variable, Derivative Action, Integral Action, Manual Mode, On-Off Control, PD Control, PI Control, Primary Proportional Band, Process Variable, Secondary Proportional Band, Setpoint and Tuning.

PLC

This stands for Programmable Logic Controller. A microprocessor based device used in machine control. It is particularly suited to sequential control applications, and uses “Ladder Logic” programming techniques. Some PLC’s are capable of basic PID control, but tend to be expensive and often give inferior levels of control.

Also refer to: PID.

Pre-Tune

The Pre-Tune facility artificially disturbs the start-up pattern so that a first approximation of the PID values can be made prior to the setpoint being reached. During Pre-Tune, the controller outputs full Primary Power until the process value has moved approximately halfway to the setpoint. At that point, power is removed (or full Secondary Power is applied for Dual Control), thereby introducing an oscillation. Once the oscillation peak has passed, the Pre-Tune algorithm calculates an approximation of the optimum PID tuning terms proportional band(s), integral and derivative. The Pre-Tune process is shown in the diagram on the next page.

51-52-25-150, Issue 1 – April 2009

Glossary

Page 151

Page 150 Page 152
Page 151
Image 151
Honeywell DCP200 manual PD Control, PI Control, PID Control, Pre-Tune
Page 150 Page 152

DCP200 specifications

The Honeywell DCP200 is an advanced distributed control platform designed to enhance efficiency, reliability, and flexibility in industrial automation. With a robust architecture capable of supporting a wide range of applications, the DCP200 is perfect for sectors including oil and gas, chemical processing, power generation, and manufacturing.

One of the key features of the Honeywell DCP200 is its scalability. It can be easily expanded to accommodate increasing demands, making it suitable for both small operations and large enterprises. This flexibility allows industries to adopt the system gradually, integrating it into their existing processes without substantial downtime or a steep learning curve.

The DCP200 is built on open standards, facilitating seamless integration with third-party systems and equipment. This compatibility ensures that companies can leverage existing infrastructures and investments, fostering a more cohesive operational environment. Enhanced interoperability is achieved via industry-standard communication protocols, enabling devices to communicate fluently across diverse platforms.

Another significant characteristic of the DCP200 is its powerful data acquisition and processing capabilities. The system utilizes state-of-the-art data analytics tools to monitor real-time information, enabling better decision-making and predictive maintenance. This proactive approach helps in reducing downtime, optimizing performance, and ultimately driving operational excellence.

The DCP200 system supports a wide range of input and output options, ensuring it can interface with various sensors, actuators, and control devices. This adaptability contributes to its function as a central hub for industrial monitoring and control, enhancing data visibility and operational responsiveness.

Security is a top priority for Honeywell, and the DCP200 employs robust cybersecurity measures to protect critical infrastructure. The system includes advanced authentication protocols and data encryption techniques, safeguarding sensitive information from unauthorized access and potential cyber threats.

User experience is also a focal point of the DCP200. The platform features an intuitive graphical user interface that simplifies navigation and enhances operator engagement. Customizable dashboards provide at-a-glance insights into system performance, aiding both operators and management in identifying areas for improvement.

In conclusion, the Honeywell DCP200 is an innovative distributed control platform that marries flexibility, scalability, and security. With its comprehensive feature set and commitment to seamless integration, it stands as a vital tool for companies aiming to enhance their automation efforts and drive operational success in an increasingly complex industrial landscape.
Top Page Image Contents